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Conference Proceedings

1. CD metrology for the 45-nm and 32-nm nodes

Rice, B.J. ; Cao, H.B. ; Chaudhuri, O. ; Grumski, M.G. ; Harteneck, B.D. ; Liddle, A. ; Olynick, D. ; Roberts, J.M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.183-190, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

2. Prospects for using primary electron-based CD metrology

Rice, B.J. ; Crays, G.L. ; Danilevsky, A. ; Grumski, M.G. ; Koshihara, S. ; Otaka, T. ; Roberts, J.M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.1247-1253, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

3. Intel benchmarking and process integration of 157-nm resists

Powers, J.M. ; Roberts, J.M. ; Zimmerman, P.A. ; Meagley, R.P. ; Putna, E.S. ; Shah, U.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.269-276, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

Conference Proceedings

4. Intel's EUV resist development

Cao, H.B. ; Roberts, J.M. ; Dalin, J. ; Chandhok, M. ; Meagley, R.P. ; Panning, E.M. ; Shell, M.K. ; Rice, B.J.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.484-491, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039