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13 results

Conference Proceedings

1. Electrical Defects in Atomic Layer Deposited HfO2 Films on Silicon: Influence ofPrecursor Chemistries and Substrate Treatment

Duenas, S. ; Castan, H. ; Garcia, H. ; Bailon, L. ; KuKli, K. ; Ritala, M. ; Leskela, M.

Pub. info.:	Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices. pp.287-299, 2006. Dordrecht. Springer
Title of ser.:	NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.:	220

Conference Proceedings

2. Alkaline Earth Cyclopentadienyl Compounds as Precursors for Atomic Layer Deposition

Hatanpaeae, T. ; Haenninen, T. ; Ihanus, J. ; Kansikas, J. ; Mutikainen, I. ; Vehkamaeki, M. ; Ritala, M. ; Leskelae, M.

Pub. info.:	Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium. pp.516-522, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-8

Conference Proceedings

3. Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source

Raeisaenen, P.I. ; Kukli, K. ; Rahtu, A. ; Ritala, M. ; Leskela, M.

Pub. info.:	CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition. pp.623-628, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-13

Conference Proceedings

4. Integration of a Quadrupole Mass Spectrometer and a Quartz Crystal Microbalance for In Situ Characterization of Atomic Layer Deposition Processes in Flow Type Reactors

Rahtu, A. ; Ritala, M.

Pub. info.:	CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition. pp.105-111, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-13

Conference Proceedings

5. Atomic Layer Deposition of High-k Oxides

Ritala, M. ; Kukli, K. ; Vehkamaeki, M. ; Haenninen, T. ; Hatanpaeae, T. ; Rdisdnten, P.J. ; Leskeld, M.

Pub. info.:	CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition. pp.597-604, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-13

Conference Proceedings

6. Dielectric Oxide Nanolaminates Deposited by Atomic Layer Epitaxy

Kukli, K. ; Ritala, M. ; Leskela, M.

Pub. info.:	Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.1137-1144, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-25

Conference Proceedings

7. ALE Growth of SrS 1-x Thin Films by Substituting Surface Sulfur with Elemental Selenium

Ihanus, J. ; Ritala, M. ; Leskelae, M.

Pub. info.:	Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.1423-1428, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-25

Conference Proceedings

8. Atomic layer deposition of metal thin films

Leskela, M. ; Aaltonen, T. ; Hamalainen, J. ; Niskanen, A. ; Ritala, M.

Pub. info.:	EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium. pp.545-554, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-09

Conference Proceedings

9. Characterization of Aluminum and Titanium Oxides Deposited on 4H-SiC by Atomic Layer Deposition Technique

Wolborski, M. ; Bakowski, M. ; Pore, V. ; Ritala, M. ; Leskela, M. ; Schoner, A. ; Hallen, A.

Pub. info.:	Silicon carbide and related materials 2004 : ECSCRM 2004 : proceedings of the 5th European Conference on Silicon Carbide and Related Materials, August 31 - September 4 2004, Bologna, Italy. pp.701-704, 2005. Uetikon-Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	483-485

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Conference Proceedings

10. Atomic Layer Deposition of Ruthenium from RuCp2 and Oxygen: Film Growth and Reaction Mechanism Studies

Aaltonen, T. ; Rahtu, A. ; Ritala, M. ; Leskelae, M.

Pub. info.:	Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium. pp.946-953, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-8

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