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14 results

Conference Proceedings

1. Verifying RET mask layouts

Mayhew, J.P. ; Rieger, M.L. ; Li, J.W. ; Zhang, L. ; Tang, Z.W. ; Shiely, J.P.

Pub. info.:	Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA. pp.336-344, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4692

Conference Proceedings

2. A methodology to calculate line-end correction feature performance as a function of reticle cost

Melvin, L.S., III ; Shiely, J.P. ; Rieger, M.L. ; Painter, B.

Pub. info.:	Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA. pp.386-394, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5042

Conference Proceedings

3. Mathematically describing the target contour in silicon such that model-based OPC can best realize design intent

Cork, C.M. ; Balasingam, P. ; Sandvik, S. ; Kielhorn, B. ; Rieger, M.L.

Pub. info.:	Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.214-223, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5379

Conference Proceedings

4. Multiple-stage optical proximity correction

Beale, D.F. ; Shiely, J.P. ; Rieger, M.L.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1202-1209, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Anticipating and controlling mask costs within EDA physical design (Invited Paper)

Rieger, M.L. ; Mayhew, J.P. ; Melvin, L.S. ; Lugg, R.M. ; Beale, D.F.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.617-627, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. A methodology to calculate line-end correction feature performance as a function of reticle cost

III, L.S.M. ; Shiely, J.P. ; Rieger, M.L. ; Painter, B.

Pub. info.:	Optical Microlithography XVI. Part One pp.441-449, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

7. Programmable RET mask layout verification

Beale, D.F. ; Mayhew, J.P, ; Rieger, M.L. ; Tang, Z.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.896-902, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. Effective distributed architecture for OPC and RET applications

Lugg, R.M. ; Boman, M. ; Burdorf, J. ; Rieger, M.L.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.903-908, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

9. Enriching design intent for optimal OPC and RET

Rieger, M.L. ; Gravoulet, V. ; Mayhew, J.P. ; Beale, D.F. ; Lugg, R.M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.132-137, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

10.

Conference Proceedings

10. Adaptive OPC with a conformal target layout

Lugg, R.M. ; Beale, D.F. ; Huang, J. ; Rieger, M.L.

Pub. info.:	Optical Microlithography XV. Part Two pp.1091-1096, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

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Author: Rieger, M.L.