1.

Conference Proceedings
Conference Proceedings
1. Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
Bauer, B.S. ; Esaulov, A. ; Makhin, V. ; Mancini, R.C. ; Paraschiv, I. ; Presura, R. ; Lindemuth, I.R. ; Sheehey, P.T. ; Rice, B.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.130-140,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Implementing flare compensation for EUV masks through localized mask CD resizing
Krautschik, C.G. ; Chandhok, M. ; Zhang, G. ; Lee, S.H. ; Goldstein, M. ; Panning, E.M. ; Rice, B.J. ; Bristol, R.L. ; Singh, V.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.58-68,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. HEIGHTS initial simulation of discharge-produced plamsa hydrodynamics and radiation transport for EUV lithography
Hassanein, A. ; Sizyuk, V. ; Tolkach, V. ; Morozov, V. ; Rice, B.J.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.714-727,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. Candidate plasma-facing materials for EUV lithography source components
Hassanein, A. ; Burtseva, T. ; Brooks, J.N. ; Konkashbaev, I.K. ; Rice, B.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.358-369,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
5.

Conference Proceedings
Conference Proceedings
5. Sources of line-width roughness for EUV resists
Cao, H.B. ; Yueh, W. ; Rice, B.J. ; Roberts, J. ; Bacuita, T. ; Chandhok, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.757-764,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Radiation-induced synergistic effects of athermal and thermal mechanisms on erosion and surface evolution of advanced electrode and condenser optics materials
Allain, J.P. ; Hassanein, A. ; Burtseva, T. ; Yacout, A. ; Insepov, Z. ; Taj, S. ; Rice, B.J.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.112-121,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
7.

Conference Proceedings
Conference Proceedings
7. Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL
Chandhok, M. ; Lee, S.H. ; Krautschik, C. ; Rice, B.J. ; Panning, E. ; Goldstein, M. ; Shell, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.86-95,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
8.

Conference Proceedings
Conference Proceedings
8. Experimental investigation of materials damage induced by hot Xe plasma in EUV lithography devices
Hassanein, A. ; Burtseva, T. ; Allain, J.P. ; Rice, B.J. ; Bakshi, V. ; Safronov, V.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.122-132,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
9.

Conference Proceedings
Conference Proceedings
9. Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems
Chandhok, M. ; Lee, S.H. ; Krautschik, C.G. ; Zhang, G. ; Rice, B.J. ; Goldstein, M. ; Panning, E. ; Bristol, R. ; Stivers, A.R. ; Shell, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.854-860,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
10.

Conference Proceedings
Conference Proceedings
10. Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices
Hassanein, A. ; Sizyuk, V. ; Tolkach, V. ; Morozov, V. ; Sizyuk, T. ; Rice, B.J. ; Bakshi, V.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.413-422,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374