1.

Conference Proceedings
Conference Proceedings
1. Optical proximity correction considering mask manufacturability and its application to 0.25-ｦﾌm DRAM for enhanced device performance
Park,C.-H. ; Rhie,S.-U. ; Choi,J.-H. ; Park,J.-S. ; Seo,H.-W. ; Kim,Y.-H. ; Park,Y.-K. ; Han,W.-S. ; Lee,W.-S. ; Kong,J.-T.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1041-1046,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Improvement of metal photo process margin with OPC and CMP for 0.14-μm DRAM technology node and beyond
Bae,D. ; Bae,J.-S. ; Sung,S.-W. ; Park,J.-S. ; Rhie,S.-U. ; Shin,D.-W. ; Chung,T.-Y. ; Kim,K.
Pub. info.: Optical Microlithography XIV.  4346  pp.1451-1461,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346