The improvement of DOF for sub-1OOnm process by focus scan [6154-56]
- Author(s):
Kim, J. C. ( Hynix Semiconductor Inc. (South Korea) ) Yang, H. J. ( Hynix Semiconductor Inc. (South Korea) ) Jeon J.-H ( Hynix Semiconductor Inc. (South Korea) ) Park C.-H ( Hynix Semiconductor Inc. (South Korea) ) Moon, J ( Hynix Semiconductor Inc. (South Korea) ) Yim D ( Hynix Semiconductor Inc. (South Korea) ) Kim J. W ( Hynix Semiconductor Inc. (South Korea) ) Tseng S ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) ) Rhe K.-K ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) ) Min Y.-H ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) ) Chen A C ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61541K
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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