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Conference Proceedings

1. Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks

Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Ackel,R. ; Caldwell,N. ; Kindt,L. ; Racette,K.C. ; Williams,C. ; Reu,P.L.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.374-382, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Predicting pattern transfer distortions during EUV mask fabrication

Reu,P.L. ; Tejeda,R.O. ; Engelstad,R.L. ; Lovell,E.G. ; Ray-Chaudhuri,A.K.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.840-847, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

3. Experimental model verification of the thermal response of optical reticles

Abdo,A.Y. ; Reu,P.L. ; Schlax,M.P. ; Engelstad,R.L. ; Beckman,W.A. ; Mitchell,J.W. ; Lovell,E.G.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1478-1483, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

4. Mechanical analysis of hard pellicles for 157-nm lithography

Reu,P.L. ; Mikkelson,A.R. ; Schlax,M.P. ; Cotte,E.P. ; Siewert,L.K. ; Engelstad,R.L. ; Lovell,E.G. ; Dao,G.T. ; Zheng,J.-F.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1166-1174, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346