1.

Conference Proceedings
Conference Proceedings
1. SNR200 chemically amplified resist optimization
Rocque,J.M. ; Puisto,D.M. ; Resnick,D.J. ; Cummings,K.D. ; Chu,W. ; Seese,P.A.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.90-99,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of negative DUV resist UVN3O for electron-beam exposure of NGL masks
Masnyj,Z.S. ; Mangat,P.J. ; Ainley,E. ; Nordquist,K,J. ; Resnick,D.J.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.525-529,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
3.

Conference Proceedings
Conference Proceedings
3. Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication
Ghelli,C.L. ; Mancini,D.P. ; Resnick,D.J. ; Mangat,P.J.S. ; Dauksher,W.J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.441-447,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication
Lu,B. ; Masnyj,Z.S. ; Mangat,P.J.S. ; Nordquist,K.J. ; Ainley,E. ; Resnick,D.J.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.771-780,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
5.

Conference Proceedings
Conference Proceedings
5. Development of two new positive DUV photoresists for use with direct-write e-beam lithography
Mancini,D.P. ; Resnick,D.J. ; Nordquist,K.J. ; Dauksher,W.J. ; Thackeray,J.W. ; McCord,M.A.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.112-121,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
6.

Conference Proceedings
Conference Proceedings
6. Low surface energy polymeric release coating for improved contact print lithography
Mancini,D.P. ; Resnick,D.J. ; Gehoski,K.A. ; Popovich,L.L. ; Chang,D.Y.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.593-599,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
7.

Conference Proceedings
Conference Proceedings
7. UV inspection of EUV and SCALPEL reticles
Pettibone,D.W. ; Bareket,N. ; Liang,T. ; Stivers,A.R. ; Hector,S.D. ; Mangat,P.J.S. ; Resnick,D.J. ; Lercel,M.J. ; Lawliss,M. ; Magg,C. ; Novembre,A.E. ; Farrow,R.C.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.241-249,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186