1.

Conference Proceedings
Conference Proceedings
1. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.554-563,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Study of the effect of amine additives on LWR and LER [6153-44]
Houlihan, F. M. ; Rentkiewicz, D. ; Lin, G. ; Rahman, D. ; Mackenzie, D. ; Timko, A. ; Kudo, T. ; Anyadiegwu, C. ; Thiyagarajan, M. ; Chiu, S. ; Romano, A. ; Dammel, R. R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615317-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
3.

Conference Proceedings
Conference Proceedings
3. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
4.

Conference Proceedings
Conference Proceedings
4. Recent advances in fluorinated resists for application at 157 nm
Houlihan, F.M. ; Sakamuri, R. ; Romano, A. ; Rentkiewicz, D. ; Dammel, R.R. ; Conley, W.E. ; Miller, D.A. ; Sebald, M. ; Stepanenko, N. ; Markert, M. ; Mierau, U. ; Vermeir, I. ; Hohle, C. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.134-150,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of novel fluorinated resist matrices for 157-nm lithography
Houlihan, F.M. ; Romano, A.R. ; Rentkiewicz, D. ; Sakamuri, R. ; Dammel, R.R. ; Conley, W. ; Rich, G.K. ; Miller, D. ; Rhodes, L.F. ; McDaniels, J.M. ; Chang, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.22-32,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039