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Conference Proceedings

1. Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes

Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.170-179, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. MEEF management and the effect of assist feature optical proximity corrections

Reilly,M.T. ; Parker,C.R. ; Robertson,S.A.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.180-187, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

3. Novel analysis technique for examining the effect of exposure conditions on the mask error enhancement factor

Robertson,S.A. ; Reilly,M.T. ; Parker,C.R.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.153-161, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

4. Process window overlap for posts and lines and spaces:optimization by resist type,optical settings,and mask bias

Reilly,M.T. ; Kvam,K. ; Willie,J.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.40-45, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

5. MEEF measurement and model verification for 0.3-k1 lithography

Parker,C.R. ; Reilly,M.T.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.33-40, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

6. Factors affecting pitch bias in lithography simulation

Robertson,S.A. ; Pavelchek,E.K. ; Swible-Keane,C.I. ; Bohiand,J.F. ; Reilly,M.T.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.744-758, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks

Reilly,M.T. ; Parker,C. ; Kvam,K. ; Socha,R.J. ; Dusa,M.V.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1209-1222, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

8. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes

Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.858-868, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Process latitude comparison of advanced DUV photoresists to latest-generation 193-nm photoresists

Joesten,L.A. ; Reilly,M.T. ; Linskens,F.T. ; Jehoul,C. ; Parker,C.R.

Pub. info.:	Optical Microlithography XIV. 4346 pp.936-944, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Conference Proceedings

10. Verification of the effect of mask on the mask error enhancement factor of contact holes

Reilly,M.T. ; Robertson,S.A. ; Parker,C.R. ; Kang,D. ; Dusa,M.V. ; MacDonald,S.S. ; West,C.A.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.948-953, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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