1.

Conference Proceedings
Conference Proceedings
1. Scatterometry for the measurement of metal features
Raymond,C.J. ; Farrer,S.W. ; Sucher,S.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.135-146,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Multiparameter CD measurements using scatterometry
Raymond,C.J. ; Murnane,M.R. ; Prins,S.L. ; Naqvi,S.S.H. ; McNeil,J.R. ; Hosch,J.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.698-709,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
3.

Conference Proceedings
Conference Proceedings
3. Scatterometry for CD measurements of etched structures
Raymond,C.J. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.720-728,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
4.

Conference Proceedings
Conference Proceedings
4. Multiparameter process metrology using scatterometry
Raymond,C.J. ; Murnane,M.R. ; Prins,S.L. ; Sohail,S. ; Naqvi,S.H. ; McNeil,J.R.
Pub. info.: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.84-93,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2638
5.

Conference Proceedings
Conference Proceedings
5. Resist and etched line profile characterization using scatterometry
Raymond,C.J. ; Naqvi,S.S.H. ; McNeil,J.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.476-486,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
6.

Conference Proceedings
Conference Proceedings
6. Scatterometry for shallow trench isolation (STI) process metrology
Raymond,C.J. ; Littau,M.E. ; Markle,R.J. ; Purdy,M.A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.716-725,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
7.

Conference Proceedings
Conference Proceedings
7. Gauge control for sub-170-nm DRAM product features
Lafferty,N. ; Gould,C.J. ; Littau,M.E. ; Raymond,C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.454-461,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
8.

Conference Proceedings
Conference Proceedings
8. Asymmetric line profile measurement using angular scatterometry
Raymond,C.J. ; Littau,M.E. ; Pitts,T. ; Nagy,P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.436-446,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344