1.

Conference Proceedings
Conference Proceedings
1. Selective Silicon Nitride Etching by ECR Plasmas Using SF6 and NF3 Based Gas Mixtures
Reyes-Betanzo, C. ; Moshkalyov, S.A. ; Swart, J.W. ; Ramos, A.C.S.
Pub. info.: Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium.  pp.292-301,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-9
2.

Conference Proceedings
Conference Proceedings
2. Synthesis of Carbon Nanotubes by Plasma-Enhanced Chemical Vapor Deposition
Moshkalyov, S.A. ; Reyes-Betanzo, C. ; Swart, J.W. ; Ramos, A.C.S.
Pub. info.: Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium.  pp.311-315,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-9
3.

Conference Proceedings
Conference Proceedings
3. Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas
Reyes-Betanzo, C. ; Moshkalyov, S.A. ; Ramos, A.C.S. ; Cotta, M.A. ; Swart, J.W.
Pub. info.: Plasma processing XIV : proceedings of the international symposium.  pp.263-276,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-17