1.

Conference Proceedings
Conference Proceedings
1. ETCH UNIFORMITY OF THERMAL OXIDE DURING HF-WET PROCESSES
Kashkoush, I. ; Novak, R.E. ; Rajaram, B. ; Carrillo, F.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.429-435,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
2.

Conference Proceedings
Conference Proceedings
2. Photoresist Stripping Using Ozone/Deionized Water Chemistry
Kashkoush, I. ; Matthews, R. ; Novak, R. ; Brause, E. ; Carrillo, F. ; Rajaram, B.
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.173-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477