1.

Conference Proceedings
Conference Proceedings
1. 10 kV SiC Power MOSFETs and JBS Diodes: Enabling Revolutionary Module and Power Conversion Technologies
M.K. Das ; D. Grider ; S. Leslie ; R. Raju ; M. Schutten
Pub. info.: Silicon carbide and related materials 2011 : selected, peer reviewed papers from the 14th International Conference on Silicon Carbide and Related Materials 2011 (ICSCRM 2011), September 11-16, 2011, Cleveland, Ohio, USA.  pp.1225-1228,  2012.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 717-720
2.

Technical Paper
Technical Paper
2. Towards Physics Based Strategies for Separation Control over an Airfoil Using Synthetic Jets
R. Raju ; R. Mittal ; L. Cattafesta
Pub. info.: AIAA meeting papers on disc.  2007.  Reston, Va..  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.: 2007
3.

Technical Paper
Technical Paper
3. Reduced-Order Models of Zero-Net Mass-Flux Jets for Large-Scale Flow Control Simulations
R. Raju ; E. Aram ; R. Mittal ; L. Cattafesta
Pub. info.: AIAA meeting papers on disc.  2008.  Reston, Va..  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Applied Aerodynamics Conference
Ser. no.: 2008
4.

Conference Proceedings
Conference Proceedings
4. Grazing incidence ion beams for reducing LER
C. R. M. Struck ; M. J. Neumann ; R. Raju ; R. L. Bristol ; D. N. Ruzic
Pub. info.: Lithography Asia 2008.  2  pp.71402P-1-71402P-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
5.

Conference Proceedings
Conference Proceedings
5. Removal of particles from lithographic masks through plasma-assisted cleaning by metastable atomic neutralization
W. M. Lytle ; D. S. Szybilski ; C. E. Das ; R. Raju ; V. Surla
Pub. info.: Lithography Asia 2008.  1  pp.71401S-1-71401S-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
6.

Conference Proceedings
Conference Proceedings
6. EUVL contamination control studies for high-volume manufacturing
D. N. Ruzic ; R. Raju ; J. Sporre ; H. Shin ; W. M. Lytle
Pub. info.: Lithography Asia 2008.  1  pp.714006-1-714006-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
7.

Conference Proceedings
Conference Proceedings
7. Plasma cleaning of nanoparticles from EUV mask materials by electrostatics
W. M. Lytle ; R. Raju ; H. Shin ; C. Das ; M. J. Neumann
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220D-1-69220D-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
8.

Conference Proceedings
Conference Proceedings
8. Plasma Sn cleaning integrated in EUV source system
H. Shin ; R. Raju ; D. N. Ruzic
Pub. info.: Emerging lithographic technologies XII.  2  pp.692132-1-692132-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921