1.

Conference Proceedings
Conference Proceedings
1. High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches
R. H. French ; V. Liberman ; H. V. Tran ; J. Feldman ; D. J. Adelman ; R. C. Wheland ; W. Qiu ; S. J. McLain ; O. Nagao ; M. Kaku ; M. Mocella ; M. K. Yang ; M. F. Lemon ; L. Brubaker ; A. L. Shoe ; B. Fones ; B. E. Fischel ; K. Krohn ; D. Hardy ; C. Y. Chen
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches
R. H. French ; H. V. Tran ; D. J. Adelman ; N. S. Rogado ; M. Kaku
Pub. info.: Optical Microlithography XXI.  1  pp.692417-1-692417-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924