1.

Conference Proceedings
Conference Proceedings
1. Measurement and evaluation of water uptake by resists, top coats, stacks, and correlation with watermark defects
P. Foubert ; M. Kocsis ; R. Gronheid ; S. Kishimura ; A. Soyano ; K. Nafus ; N. Stepanenko ; J. D. Backer ; N. Vandenbroeck ; M. Ercken
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Screening of second-generation high-index liquids
E. Hendrickx ; S. Postnikov ; P. Foubert ; R. Gronheid ; B. Kim
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. A novel method for characterizing resist performance
D. V. Steenwinckel ; R. Gronheid ; J. H. Lammers ; A. M. Meyers ; F. V. Roey ; P. Willems
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
4.

Conference Proceedings
Conference Proceedings
4. Alternative process schemes for double patterning that eliminate the intermediate etch step
M. Maenhoudt ; R. Gronheid ; N. Stepanenko ; T. Matsuda ; D. Vangoidsenhoven
Pub. info.: Optical Microlithography XXI.  1  pp.69240P-1-69240P-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
5.

Conference Proceedings
Conference Proceedings
5. Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
B. M. Rathsack ; S. Scheer ; Y. Kuwahara ; J. Kitano ; R. Gronheid
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692315-1-692315-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
6.

Conference Proceedings
Conference Proceedings
6. EUV lithography program at IMEC
A. M. Goethals ; R. Jonckheere ; G. F. Lorusso ; J. Hermans ; F. V. Roey ; A. Myers ; M. Chandhok ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; R. Gronheid ; B. Baudemprez ; K. Ronse
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
7.

Conference Proceedings
Conference Proceedings
7. Extraction and identification of resist modeling parameters for EUV lithography
C. A. Fonseca ; R. Gronheid ; S. A. Scheer
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230T-1-69230T-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923