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Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

Author(s):
Chen,J.F. ( ASML MaskTools,Inc. )
Socha,R.J.
Puntambekar,K.
Wampler,K.E.
Caldwell,R.F.
Dusa,M.V.
Love,J.C.
Yeric,G.
Stoner,B.
4 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
168
Page(to):
177
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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