1.

Conference Proceedings
Conference Proceedings
1. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Impact of lithography variability on statistical timing behavior
Progler, C.J. ; Borna, A. ; Blaauw, D. ; Sixt, P.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.101-110,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
3.

Conference Proceedings
Conference Proceedings
3. Cost effective strategies for ASIC masks
Pramanik, D. ; Kamberian, H.H. ; Progler, C.J. ; Sanie, M. ; Pinto, D.
Pub. info.: Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA.  pp.142-152,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5043
4.

Conference Proceedings
Conference Proceedings
4. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. CPL mask technology for sub-100-nm contact hole imaging
Kasprowicz, B.S. ; Conley, W.E. ; Litt, L.C. ; Van Den Broeke, D.J. ; Montgomery, P.K. ; Socha, R.J. ; Wu, W. ; Lucas, K.D. ; Roman, B.J. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Progler, C.J. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.624-631,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. Critical evaluation of photomask needs for competing 65-nm node RET options
Progler, C.J. ; Xiao, G.
Pub. info.: Optical Microlithography XVI.  Part One  pp.171-181,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. Minimization of image placement errors in chromeless phase-shift mask lithography
Fritze, M. ; Tyrrell, B. ; Cann, S.G. ; Carney, C. ; Blachowicz, B.A. ; Brzozowy, D. ; Kocab, T. ; Bowdoin, S. ; Rhyins, P.D. ; Progler, C.J. ; Martin, P.
Pub. info.: Optical Microlithography XV.  Part One  pp.426-436,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Application of chromeless phase lithography (CPL) masks in ArF lithography
Kasprowicz, B.S. ; Progler, C.J. ; Wu, W. ; Conley, W. ; Litt, L.C. ; Van Den Broeke, D.J. ; Wampler, K.E. ; Socha, R.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1189-1201,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.408-419,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
10.

Conference Proceedings
Conference Proceedings
10. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040