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12 results

Conference Proceedings

1. Device and lithography contextual mask rule generation

Ham, Y. M. ; Dillon, B. ; Progler, C. ; Goldammer, K. ; Jin, Z. ; Green, G. ; Mackay, R. S. ; Divecha, H. ; Boksha, V. ; Martin, P. ; Heins, M. ; Zhang, Y. ; Davis, K. ; Marutyan, R. ; Martirosyan, K. ; Bakarian, S.

Pub. info.:	Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.319-330, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5756

Conference Proceedings

2. Mask cost analysis via write time estimation

Zhang, Y. ; Gray, R. ; Chou, S. ; Rockwell, B. ; Xiao, G. ; Kamberian, H. ; Cottle, R. ; Wolleben, A. ; Progler, C.

Pub. info.:	Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.313-318, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5756

Conference Proceedings

3. Correlation analysis of CD-variation and circuit performance under multiple sources of variability

Borna, A. ; Progler, C. ; Blaauw, D.

Pub. info.:	Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.168-177, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5756

Conference Proceedings

4. LASER INDUCED FORWARD TRANSFER

Baseman, R. J. ; Gupta, A. ; Sausa, R. C. ; Progler, C.

Pub. info.:	Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA. pp.237-242, 1988. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	101

Conference Proceedings

5. Design process optimization, virtual prototyping of manufacturing, and foundry-portable DFM(Invited Paper)

Hogan, J. ; Progler, C. ; Chatila, A. ; Bruggeman, B. ; Heins, M. ; Pack, R. ; Boksha, V.

Pub. info.:	Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.21-38, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5756

Conference Proceedings

6. The effect of polarized 193nm irradiation on photomask haze formation

Kim, Y. D. ; Kang, H. B. ; Zhang, Y. ; Tran, C. ; Farrar, N. ; Qin, J. ; Rockwell, B. ; Cho, H. J. ; Cottle, R. ; Chan, D. ; Martin, P. ; Choi, S. S. ; Progler, C.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1586-1590, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

7. The impact of illumination on feature fidelity for CPL mask technology

Kuijten, J. P. ; Verhappen, A. ; Conley, W. ; van de Goor, S. ; Litt, L. ; Wu, W. ; Lucas, K. ; Roman, B. ; Kasprowicz, B. ; Progler, C. ; Socha, R. ; van den Broeke, D. ; Wampler, K. ; Laidig, T. ; Hsu, S.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1557-1561, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

8. Dynamic laser speckle in optical projection lithography: causes, effects on CDU and LER, and possible remedies

Jhaveri, T. ; Cottle, R. ; Zhang, Y. ; Progler, C.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.274-284, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

9. A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19]

Cottle, R. ; Sixt, P. ; Lassiter, M. ; Cangemi, M. ; Martin, P. ; Progler, C.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920J-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

10.

Conference Proceedings

10. High transmission mask technology for 45nm node imaging [6154-38]

Conley, W. ; Morgana, N. ; Kasprowicz, B. S. ; Cangemi, M. ; Lassiter, M. ; Litt, L. C. ; Cangemi, M. ; Cottle, R. ; Wu, W. ; Cobb, J. ; Ham, Y. -M. ; Lucas, K. ; Roman, B. ; Progler, C.

Pub. info.:	Optical Microlithography XIX. pp.615411-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

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Author: Progler, C.