1.

Conference Proceedings
Conference Proceedings
1. Applications of image diagnostics to metrology quality assurance and process control
Allgair, J.A. ; Boksha, V.V. ; Bunday, B.D. ; Diebold, A.C. ; Cole, D.C. ; Davidson, M.P. ; Hutcheson, J.D. ; Gurnell, A.W. ; Joy, D.C. ; McIntosh, J.M. ; Muckenhirn, S.G. ; Pellegrini, J.C. ; Larrabee, R.D. ; Potzick, J.E. ; Vlada, A.E. ; Smith, N.P. ; Starikov, A. ; Sulivan, N.T. ; Wells, O.C.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.251-277,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. New NIST photomask Iinewidth standard
Potzick, J.E. ; Pedulla, J.M. ; Stocker, M.T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.343-353,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Updated NIST photomask linewidth standard
Potzick, J.E. ; Pedulla, J.M. ; Stocker, M.T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.338-349,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038