1.

Conference Proceedings
Conference Proceedings
1. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. MEV as a new constraint for lithographers in the sub-100-nm regime
Trouiller, Y. ; Postnikov, S.V. ; Lucas, K.D. ; Sundermann, F. ; Patterson, K. ; Belledent, J. ; Couderc, C. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1081-1092,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Monte Carlo method for highly efficient and accurate statistical lithography simulations
Postnikov, S.V. ; Lucas, K. ; Wimmer, K. ; Ivin, V. ; Rogov, A.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1118-1126,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets
Hector, S.D. ; Postnikov, S.V. ; Cobb, J.
Pub. info.: Optical Microlithography XVII.  pp.555-570,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Lithographic process window analysis by statistical means
Bourov, A. ; Postnikov, S.V. ; Lucas, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.484-491,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
6.

Conference Proceedings
Conference Proceedings
6. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
7.

Conference Proceedings
Conference Proceedings
7. Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.408-419,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
8.

Conference Proceedings
Conference Proceedings
8. Investigation of product design weaknesses using model-based OPC sensitivity analysis
Postnikov, S.V. ; Lucas, K. ; Garza, C.M. ; Wimmer, K. ; LaCour, P. ; Word, J.C.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.160-171,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
9.

Conference Proceedings
Conference Proceedings
9. Fabrication of integrated circuits with high yield using ultra-thin resist processes
Peters, R.D. ; Postnikov, S.V. ; Cobb, J.L. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. Jr., ; Wu, W. ; Hector, S.D.
Pub. info.: Advances in resist technology and processing XX.  2  pp.1390-1401,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039