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17 results

Conference Proceedings

1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.138-150, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.42-57, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

3. Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography

Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.12-27, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

4. Potentials of online scanning electron microscope performance analysis using NIST reference material 8091

Postek,M.T. ; Vladar,A.E. ; Zhang,N.-F. ; Larrabee,R.D.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.28-37, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

5. Is a production-level scanning electron microscope linewidth standard possible?

Postek,M.T. ; Vladar,A.E. ; Villarrubia,J.S.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.42-56, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

6. Linewidth measurement intercomparison on a BESOI sample

Villarrubia,J.S. ; Vladar,A.E. ; Lowney,J.R. ; Postek,M.T. ; Allen,R.A. ; Cresswell,M.W. ; Ghoshtagore,R.N.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.84-95, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

7. New algorithm for the measurement of pitch in metrology instruments

Zhang,N.F. ; Postek,M.T. ; Larrabee,R.D. ; Carroll,L. ; Keery,W.J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.147-158, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

Conference Proceedings

8. Dimensional metrology at the nanometer level:combined SEM and PPM

Postek,M.T. ; Ho,H.J. ; Weese,H.L.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.250-263, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

Conference Proceedings

9. Statistical measure for the sharpness of SEM images

Zhang,N.F. ; Postek,M.T. ; Larrabee,R.D. ; Vladar,A.E. ; Keery,W.J. ; Jones,S.N.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.375-387, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

10.

Conference Proceedings

10. Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrology

Postek,M.T. ; Vladar,A.E. ; Davidson,M.P.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.68-79, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

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