Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.162-169, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.206-214, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.277-287, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.328-333, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VII. pp.650-660, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering