1.

Conference Proceedings
Conference Proceedings
1. Mighty high-T lithography for 65-nm generation contacts
Conley, W. ; Montgomery, P.K. ; Lucas, K. ; Litt, L.C. ; Maltabes, J.G. ; Dieu, L. ; Hughes, G.P. ; Mellenthin, D.L. ; Socha, R.J. ; Fanucchi, E.L. ; Verhappen, A. ; Wampler, K.E. ; Yu, L. ; Schaefer, E. ; Cassel, S. ; Kuijten, J.P. ; Pijnenburg, W. ; Wiaux, V. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1210-1219,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Defect printability in CPL mask technology
Kuijten, J.-P. ; Verhappen, A. ; Pijnenburg, W. ; Conley, W. ; Litt, L.C. ; Wu, W. ; Montgomery, P. ; Roman, B.J. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Van Den Broeke, D.J. ; Schaefer, E. ; Cook, P.
Pub. info.: Optical Microlithography XVII.  pp.1032-1039,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. The impact of MEEF through pitch for 120-nm contact holes
Litt, L.C. ; Wu, W. ; Conley, W. ; Lucas, K.D. ; Roman, B.J. ; Montgomery, P. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Verhappen, A. ; Wampler, K.E. ; Schaefer, E. ; Cook, P. ; Kuijten, J.-P. ; Pijnenburg, W.
Pub. info.: Optical Microlithography XVII.  pp.1305-1314,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377