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Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization

Author(s):
Scott Warrick
Paul Hinnen
Rob Morton
Kevin Cooper
Pierre-Olivier Sassoulas
Jerome Depre
Ramon Navarro
Richard van Haren
Clyde Browning
Doug Reber
Henry Megens
6 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
2
Page(from):
854
Page(to):
864
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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