1.
Conference Proceedings
Lee,S.H. ; Piao,F. ; Naulleau,P. ; Goldberg,K.A. ; Gldharn,W.G. ; Bokor,J.
Pub. info.:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California . pp.724-731, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
2.
Conference Proceedings
Schenker,R.E. ; Piao,F. ; Oldham,W.G.
Pub. info.:
Optical Microlithography IX . Part2 pp.698-706, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2726
3.
Conference Proceedings
Piao,F. ; Schenker,R.E. ; Oldham,W.G.
Pub. info.:
Optical Microlithography X . pp.907-912, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
4.
Conference Proceedings
Schenker,R.E. ; Piao,F. ; Oldham,W.G.
Pub. info.:
Optical Microlithography X . pp.44-53, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051