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27 results

Conference Proceedings

1. Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]

Bekaert, J. ; Philipsen, V. ; Vandenberghe, G. ; van den Broeke, D. ; Degel, W. ; Zibold, A.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59921O-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

2. Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]

Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.

Pub. info.:	Optical Microlithography XIX. pp.61541E-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

3. Reliable subnanometer repeatability for CD metrology in a reticle production environment

Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Hartmann, M. ; Ordynskyy, V. ; Peter, K. ; Schaetz,T. ; Sommer, K.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.319-327, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

4. Extended defect printability study for 100-nm design rule using 193-nm lithography

Philipsen, V. ; Jonckheere, R.M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.509-519, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

5. Defect printability for 100-nm design rule using 193-nm lithography

Philipsen, V. ; Jonckheere, R.M. ; Kohlpoth, S. ; Torres, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.640-651, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.

Pub. info.:	Optical Microlithography XV. Part Two pp.1180-1189, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

7. Feasibility study of embedded binary masks [6349-21]

Cangemi, M. ; Philipsen, V. ; Leunissen, L. H. A. ; Taylor, D.

Pub. info.:	Photomask Technology 2006. pp.63490L-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

8. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]

Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61522F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152

Conference Proceedings

9. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]

Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

10.

Conference Proceedings

10. Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]

Lee, -W. S. ; Leunissen, A. H. L. ; Van de Kerhove, J. ; Philipsen, V. ; Jonckheere, R. ; Lee, -J. S. ; Woo, -G. S. ; Cho, -K. H. ; Moon, -T. J.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810U-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

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Author: Philipsen, V.