1.

Conference Proceedings
Conference Proceedings
1. PHOTORESIST STRIPPING USING SUPERCRITICAL CO2 - BASED PROCESSES
Perrut, V. ; Danel, A. ; Millet, C. ; Daviot, J. ; Rignon, M. ; Tardif, F.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.246-253,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. COPPER LOW-k CONTAMINANTION AND POST ETCH RESIDUES REMOVAL USING SUPERCRITICAL C02-BASED PROCESSES
Millet, C. ; Daviot, J. ; Danel, A. ; Perrut, V. ; Tardif, F. ; Broussous, L. ; Renault, O.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.271-278,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26