1.

Conference Proceedings
Conference Proceedings
1. Application of optical CD metrology based on both spectroscopic ellipsometry and scatterometry for Si-recess monitor [6152-17]
Huang, P. C. Y. ; Chen, R. C. J. ; Chen, F. C. ; Perng, B. C. ; Shieh, J. H. ; Jang, S. M. ; Liang, M. S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61520H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
2.

Conference Proceedings
Conference Proceedings
2. Accurate in-line CD metrology for nanometer semiconductor manufacturing [6152-26]
Perng, B. C. ; Shieh, J. H. ; Jang, S. M. ; Liang, M.-S. ; Huang, R. ; Chen, L. C ; Hwang, R. L. ; Hsu, J ; Fong, D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61520Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152