1.

Conference Proceedings
Conference Proceedings
1. Narrow-channel transistor threshold self-adjustment technique for ULSI with LOCOS isolation
Loiko,K.V. ; Peidous,I.V. ; Ho,H.-M. ; Bromley-Barratt,J.F. ; Quek,E.K.B. ; Lim,D.H.Y.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.383-385,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
2.

Conference Proceedings
Conference Proceedings
2. Threshold Stresses of Dislocation Generation Onset in Silicon
Peidous,I.V. ; Loiko,K.V. ; Balasubramanian,N. ; Schuelke,T.
Pub. info.: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.180-188,  2000.  Pennington, N.J., Bellingham, Wash..  Electrochemical Society — SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4218
3.

Conference Proceedings
Conference Proceedings
3. Screening of Dislocations in Silicon by Point Defects
Peidous,I.V. ; Loiko,K.V.
Pub. info.: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.145-155,  2000.  Pennington, N.J., Bellingham, Wash..  Electrochemical Society — SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4218
4.

Conference Proceedings
Conference Proceedings
4. Stress-induced leakage currents of CMOS ULSI devices with shallow trench isolation
Sundaresan,R. ; Gan,C.H. ; Peidous,I.V.
Pub. info.: Microelectronic Device Technology III.  pp.224-233,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3881