Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.445-, 1999. Warrendale, PA. MRS - Materials Research Society
Rying, E.A. ; Gyurcsik, R.S. ; Lu, J.C. ; Bilbro, G. ; Parsons, G. ; Sorrell, F.Y.
Pub. info.:
Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing. pp.37-44, 1997. Pennington, NJ. Electrochemical Society
Ayres, J. ; Walker, B. ; Chandra, L.. K.. ; Stefanescu, D. ; Chu, C. ; Parsons, G. ; Gorman, C.
Pub. info.:
Nanostructure Integration Techniques for Manufacturable Devices, Circuits, and Systems: Interfaces, Interconnects, and Nanosystems. pp.60030J-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering