1.

Conference Proceedings
Conference Proceedings
1. 193nm dual layer organic BARCS for high NA immersion lithography
Montgomery, P. K. ; Peters, R. ; Garza, C. ; Cobb, J. ; Darlington, B. ; Parker, C. ; Filipiak, S. ; Babbitt, D.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.417-435,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs
Srivastava, A. ; Osburn, C.M. ; Yee, K.F. ; Heinisch, H.H. ; Vogel, E.M ; Abmed, K.Z. ; Wang, Z. ; Min, K. ; TimberJoke, B. ; Parker, C. ; Worimnan, J.J. ; Hauser, J.R.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.81-88,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
3.

Conference Proceedings
Conference Proceedings
3. 31 New Materials, Processes and Device Structures for 65nm CMOS Technology Node and Beyond
Nguyen, B.-Y. ; Them, A. ; Zhang, D. ; White, T. ; Sadaka, M. ; Triyoso, D. ; Schaeffer, J. ; Goolsby, B. ; Dhandapani, V. ; Nguyen, T. ; Vartanian, V. ; McCormick, L. ; Theodore, D. ; Zollner, S. ; Xie, Q. ; Wang, X.-D. ; Canonico, M. ; Kotte, M. ; Shi, Z. ; Mathew, L. ; Zavala, M. ; Parker, C. ; Cottard, H. ; Hildreth, J. ; Prabhu, L. ; Rai, R. ; Murphy, S. ; Montgomery, P. ; Kalpat, S. ; Ramon, M. ; Demkov, A. ; Taylor, B. ; Gilmer, D. ; Adams, V. ; Jiang, J. ; Chen, J. ; Chang, C.-H. ; Kaushik, V. ; Chandna, L. ; Sadd, M. ; Barr, A. ; Vandooren, A. ; Pham, D. ; Mendlcino, M. ; Cheek, J. ; Tseng, H. ; White, B. ; Tobin, P. ; Orlowski, M. ; Venkatesan, S. ; Mogab, J. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.259-273,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of 2.0nm Grown and Deposited Dielectrics in 0.1ｦﾌm PMOSFETs
Srivastava, A. ; Heinisch, H. H. ; Vogel, E. ; Parker, C. ; Osburn, C. M. ; Masnari, N. A. ; Wortman, J. J. ; Hauser, J. R.
Pub. info.: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.163-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 525
5.

Conference Proceedings
Conference Proceedings
5. Incorporation of Nitrogen Atoms at Si/SiO2 Interfaces of Field Effect Transistors (FETs) to Improve Device Reliability
Lucovsky, G. ; Lee, D. R. ; Jing, Z. ; Whitten, J. L. ; Parker, C. ; Hauser, J. R.
Pub. info.: Surface/interface and stress effects in electronic material nanostructures : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.321-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 405
6.

Conference Proceedings
Conference Proceedings
6. Applications of CPL mask technology for sub-65nm gate imaging
Litt, L. C. ; Conley, W. ; Wu, W. ; Peters, R. ; Parker, C. ; Cobb, J. ; Kasprowicz, B. S. ; van den Broeke, D. ; Park, J. C. ; Karur-Shanmugam, R.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1459-1468,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
7.

Conference Proceedings
Conference Proceedings
7. A 0.25mm MOSFET Technology Using In-Situ Rapid Thermal Gate Dielectrics
Zhang, K.X. ; Osburn, C.M. ; Hames, G. ; Parker, C. ; Bayoumi, A.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.68-79,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
8.

Conference Proceedings
Conference Proceedings
8. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D. ; Lucas, K. ; Cobb, J.L. ; Parker, C. ; Patterson, K. ; McCauley, R. ; Ercken, M. ; Roey, F.V. ; Vandenbroeck, N. ; Pollentier, I.K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1131-1142,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
10.

Conference Proceedings
Conference Proceedings
10. Integration of UTR processes into MPU IC manufacturing flows
Cobb, J.L. ; Dakshina-Murthy, S. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. ; Peters, R.D. ; Wu, W. ; Hector, S.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.277-286,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690