1.

Conference Proceedings
Conference Proceedings
1. Optimization of ARC process in DUV lithography
Shim,K.-J. ; Choi,B.-I. ; Park,K.-Y. ; Lee,W.-G.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.692-701,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Reduction of wafer-scale error between DI and FI in multilevel metallization hy adjusting edge detedion method
Bae,S.-G. ; Kim,Y.-K. ; Park,K.-Y. ; Kim,J.-S. ; Lee,W.-G. ; Lee,S.-W. ; Lee,D.-H.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.460-469,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Improvement of resist profile roughness in bilayer resist process
Jeong,C.-Y. ; Ryu,S. ; Park,K.-Y. ; Lee,W.G. ; Lee,S.-W. ; Lee,D.-H.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.818-826,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Design of piezoelectric sensors and actuators using positioning,sizing,and electrode shading
Ryou,J.-K. ; Park,K.-Y. ; Kim,S.-J.
Pub. info.: Smart structures and materials 1997 : Mathematics and control in smart structures : 3-6 March 1997, San Diego, California.  pp.747-753,  1997.  Bellingham.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3039
5.

Conference Proceedings
Conference Proceedings
5. Process optimization by reducing I-D bias for 0.25-ｦﾌm logic devices
Park,K.-Y. ; Choi,B.-I. ; Lee,W.-G. ; Ko,C.-G.
Pub. info.: Optical Microlithography X.  pp.170-181,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051