1.

Conference Proceedings
Conference Proceedings
1. Practical approach to control the full-chip-level gate CD in DUV lithography
Park,C.-H. ; Kim,Y.-H. ; Lee,H.-J. ; Kong,J.-T. ; Lee,S.-H.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.215-223,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Optical proximity correction considering mask manufacturability and its application to 0.25-ｦﾌm DRAM for enhanced device performance
Park,C.-H. ; Rhie,S.-U. ; Choi,J.-H. ; Park,J.-S. ; Seo,H.-W. ; Kim,Y.-H. ; Park,Y.-K. ; Han,W.-S. ; Lee,W.-S. ; Kong,J.-T.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1041-1046,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Systematlc approach to correct critical patterns Induced by the lithography process at the full-chip level
Park,C.-H. ; Kim,Y.-H. ; Park,J.-S. ; Kim,K.-D. ; Yoo,M.-H. ; Kong,J.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.622-629,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Robust and fast OPC approach for metal interconnects of 0.13um logic devices
Park,J.-S. ; Kim,D.-H. ; Park,C.-H. ; Kim,Y.-H. ; Yoo,M.-H. ; Kong,J.-T. ; Kim,H.-W. ; Yoo,S.-I.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1104-1111,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
5.

Conference Proceedings
Conference Proceedings
5. Optimum field-size strategy for DRAM mass production in low-k1 process
Park,C.-H. ; Yim,D. ; Lee,S.-H. ; Yang,H.-J. ; Choi,J.-H. ; Shin,Y.-C. ; Kim,C.-D. ; Choi,J.-S. ; Kang,K.-O. ; Kim,S.-W. ; Lee,D.-D. ; Yoon,G.-H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1011-1019,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Automatic gate CD control for a full-chip-scale SRAM device
Park,C.-H. ; Kim,T.-K. ; Lee.H.-J ; Kong.J.-T ; Lee.S.-H
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.350-357,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236