1.

Conference Proceedings
Conference Proceedings
1. Flare-induced CD variation correction using transmittance controlled mask
Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.561-569,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask
Park, J.R. ; Kim, S.H. ; Yeo, G.-S. ; Choi, S.-W. ; Ki, W.-T. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.553-560,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
Choi, Y.-H. ; Park, J.R. ; Sung, M.-G. ; Yang, S.-H. ; Kim, S.-H. ; Lee, H.-J. ; Lee, J.-Y. ; Jang, I.Y. ; Kim, Y.H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.819-825,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889