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6 results

1.

Conference Proceedings

1. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.78-85, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

2.

Conference Proceedings

2. 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

Park, D.-I. ; Seo, S.-K. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.-H.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.634-640, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

3.

Conference Proceedings

3. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.392-399, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

4.

Conference Proceedings

4. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Jeong, W.-G. ; Park, D.-I. ; Park, E.-S. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.157-167, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

5.

Conference Proceedings

5. The feasibility study of thin Cr film for low process bias

Seo, W.-W. ; Yoon, S.-Y. ; Park, D.-I. ; Park, E.-S. ; Kim, J.-M. ; Jeong, S.-M. ; Choi, S.-S. ; Cha, H.-S. ; Nam, K.S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.136-143, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

6.

Conference Proceedings

6. A study of post-exposure baking effect for CAR process in photomask fabrication

Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.190-196, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

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