1.

Conference Proceedings
Conference Proceedings
1. Transparent Transistor Development
Hong, D. ; Dehuff, N.L. ; Presley, R.E. ; Munsee, C.L. ; Bender, J.P. ; Park, C.-H. ; Wager, J.F. ; Keszler, D.A.
Pub. info.: Critical interfacial issues in thin-film optoelectronic and energy conversion devices : symposium held December 1-3, 2003, Boston, Massachusetts, U.S.A..  pp.99-104,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 796
2.

Conference Proceedings
Conference Proceedings
2. Transparent electronics and prospects for transparent displays
Wager, J.F. ; Valencia, M.M. ; Bender, J.P. ; Norris, B.J. ; Chiang, H.Q. ; Hong, D. ; Norris, L.N. ; Harman, T.V. ; Park, S. ; Anderson, J.T. ; Park, C.-H. ; Keszler, D.A. ; Tate, J. ; Yanagi, H. ; Price, M.F. ; Hoffman, R.L.
Pub. info.: Cockpit displays X : 22-25 April 2003, Oriando, Florida, USA.  pp.330-339,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5080
3.

Conference Proceedings
Conference Proceedings
3. Wafer topography-aware optical proximity correction for better DOF margin and CD control [5853-71]
Gupta, P. ; Kahng, A. B. ; Park, C.-H. ; Samadi, K. ; Xu, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.844-854,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node
Choi, S.-H. ; Park, J.-S. ; Park, C.-H. ; Chung, W.-Y. ; Kim, I.-S. ; Kim, D.-H. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1176-1183,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Fast dual graph-based hotspot detection [6349-148]
Kahng, A. B. ; Park, C.-H. ; Xu, X.
Pub. info.: Photomask Technology 2006.  pp.63490H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Aberration sensitivity control for the isolation layer in low-k1 DRAM process
Cho, B.-H. ; Yim, D. ; Park, C.-H. ; Lee, S.-H. ; Yang, H.-J. ; Choi, J.-H. ; Shin, Y.-C. ; Kim, C.-D. ; Choi, J.-S. ; Kang, K.-O. ; Kim, S.-W. ; Yu, T.-H. ; Hong, J. ; Kim, J.-C. ; Han, M.-S. ; Heo, H.-Y. ; Kim, Y.-D. ; Lee, D.-D. ; Yoon, G.-H. ; van schoot, J.B. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.831-839,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Hybrid PPC methodology and implementation in the correction of etch proximity
Park, C.-H. ; Rhie, S.-U. ; Chio, S.-H. ; Kim, D.-H. ; Park, J.-S. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.369-376,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
Hong, J.-S. ; Park, C.-H. ; Kim, D.-H. ; Choi, S.-H. ; Ban, Y.-C. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.571-580,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Improving OPC quality via interactions within the design-to-manufacturing flow (Invited Paper) [5853-99]
Gupta, P. ; Kahng, A. B. ; Park, C.-H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.131-140,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
10.

Conference Proceedings
Conference Proceedings
10. CD uniformity improvement by active scanner corrections
van Schoot, J.B. ; Noordman, O. ; Vanoppen, P. ; Blok, F. ; Yim, D. ; Park, C.-H. ; Cho, B.-H. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part One  pp.304-314,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691