1.

Conference Proceedings
Conference Proceedings
1. Visible/UV image projector for sensor testing [6208-23]
Ginn, R. ; Solomon, S. ; Mackin, R. P. ; Park, -J. S. ; Eden, G. J. ; Wedding, C.
Pub. info.: Technologies for synthetic environments : hardware-in-the-loop testing XI : 18-20 April 2006, Kissimmee, Florida, USA.  pp.62080O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6208
2.

Conference Proceedings
Conference Proceedings
2. A study for effect of rounded contact hole pattern by laser mask writng machine onto wafer process margin [6283-15]
Park, -J. S. ; Yoon, -H. K. ; Kang, -H. J. ; Choi, -Y. J. ; Lee, -S. Y. ; Kim. K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. TaN-based EUV mask absorber etch study [6283-84]
Du, Y. ; Choi, J. C. ; Zhang, G. ; Park, -J. S. ; Yan, -Y. P. ; Baik, -H. K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62833D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. EUV mask pattern defect printability [6283-95]
Liang, T. ; Zhang, G. ; Naulleau, P. ; Myers, A. ; Park, -J. S. ; Stivers, A. ; Vandentop, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283