1.

Conference Proceedings
Conference Proceedings
1. Laser cleaning of optical elements in 157-nm lithography
Bloomstein,T.M. ; Rothschild,M. ; Liberman,V. ; Hardy,D.E. ; Efremow,N.N.,Jr. ; Palmacci,S.T.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1537-1545,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Laser micromachining of silicon: a new technique for fabricating terahertz imaging arrays
Walker,C.K. ; Hungerford,A.L. ; Narayanan,G. ; Groppi,C. ; Bloomstein,T.M. ; Palmacci,S.T. ; Stern,M.B. ; Curtin,J.E.
Pub. info.: Advanced technology MMW, radio, and terahertz telescopes : 26-28 March 1998, Kona, Hawaii.  pp.45-52,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3357
3.

Conference Proceedings
Conference Proceedings
3. Controlled contamination of optics under 157-nm laser irradiation
Bloomstein,T.M. ; Liberman,V. ; Palmacci,S.T. ; Rothschild,M.
Pub. info.: Optical Microlithography XIV.  4346  pp.685-694,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. UV cleaning of contaminated 157-nm reticles
Bloomstein,T.M. ; Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Hardy,D.E. ; Palmacci,S.T.
Pub. info.: Optical Microlithography XIV.  4346  pp.669-675,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Marathon evaluation of optical materials for 157-nm lithography
Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Palmacci,S.T. ; Sedlacek,J.H.C. ; Peski,C.K.Van ; Orvek,K.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.45-51,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346