1.

Conference Proceedings
Conference Proceedings
1. Bottom antireflective coatings for ArF, KrF, and i-line applications: a comparison of theory, design, and lithographic aspects
Padmanaban, M. ; Ding, S. ; Ficner, S. A. ; Kang, W. -B. ; Khanna, D. N. ; Dammel, R. R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.550-561,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions
Rahman, M. D. ; Dammel, R. R. ; Cook, M. M. ; Ficner, S. A. ; Padmanaban, M. ; Oberlander, J. E. ; Durham, D. ; Klauck-Jacobs, A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1193-1200,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Thermal phenomena in acrylic 193-nm resists
Paniez, P. J. ; Gally, S. ; Mortini, B. P. ; Rosilio, C. ; Sassoulas, P. -O. ; Dammel, R. R. ; Padmanaban, M. ; Klauck-Jacobs, A. ; Oberlander, J. E.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1352-1363,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography
Padmanaban, M. ; Renfkiewicz, D. ; Lee, S. ; Hong, C. ; Lee, D. ; Rahman, D. ; Sakamuri, R. ; Dammel, R. R.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.252-260,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. Study of the effect of amine additives on LWR and LER [6153-44]
Houlihan, F. M. ; Rentkiewicz, D. ; Lin, G. ; Rahman, D. ; Mackenzie, D. ; Timko, A. ; Kudo, T. ; Anyadiegwu, C. ; Thiyagarajan, M. ; Chiu, S. ; Romano, A. ; Dammel, R. R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615317-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
6.

Conference Proceedings
Conference Proceedings
6. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
7.

Conference Proceedings
Conference Proceedings
7. E-beam curing effects on the etch and CD-SEM stability of 193-nm resists
Padmanaban, M. ; Alemy, E. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; McKenzie, D.S. ; Orsi, A. ; Rahman, D. ; Chen, W.-L. ; Sadjadi, R.M. ; Livesay, W.R. ; Ross, M.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.606-614,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
8.

Conference Proceedings
Conference Proceedings
8. High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
Rahman, M.D. ; Alemy, E. ; Conley, W. ; Miller, D. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.127-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
9.

Conference Proceedings
Conference Proceedings
9. Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists
Kudo, T. ; Alemy, E.L. ; Dammel, R.R. ; Kim, W.-K. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Rahman, M.D. ; Romano, A.R. ; Padmanaban, M. ; Chun, J.-S. ; Jung, J.-C. ; Lee, S.-K. ; Shin, K.-S. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.150-159,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
10.

Conference Proceedings
Conference Proceedings
10. Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions
Masuda, S. ; Kobayashi, M. ; Kim, W.-K. ; Anyadiegwu, C. ; Padmanaban, M. ; Dammel, R.R. ; Tanaka, K. ; Yamada, Y.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.819-829,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376