Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment. pp.253-262, 2008. Pennington, N.J.. Electrochemical Society
P. Kirsch ; M. Quevedo-Lopez ; S. Krishnan ; S. Song ; R. Choi ; P. Majhi ; Y. Senzaki ; G. Bersuker ; B. Lee
Pub. info.:
Atomic layer deposition : at the 208th ECS Meeting, October 16-21, 2005, Los Angeles, California, USA. pp.15-28, 2006. Pennington, N.J.. Electrochemical Society