1.

Conference Proceedings
Conference Proceedings
1. 45nm design rule in-die overlay metrology on immersion lithography processes
Y. Shih ; G. K. Huang ; C. Yu ; M. Adel ; C. K. Huang ; P. Izikson ; E. Kassel ; S. Mathur ; C. Huang ; D. Tien ; Y. Avrahamov
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Improved overlay control through automated high order compensation
S. Wakamoto ; Y. Ishii ; K. Yasukawa ; A. Sukegawa ; S. Maejima ; A. Kato ; J. C. Robinson ; B. J. Eichelberger ; P. Izikson ; M. Adel
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Differential signal scatterometry overlay metrology: an accuracy investigation
D. Kandel ; M. Adel ; B. Dinu ; B. Golovanevsky ; P. Izikson ; V. Levinski ; I. Vakshtein ; P. Leray ; M. Vasconi ; B. Salski
Pub. info.: Optical Measurement Systems for Industrial Inspection V.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6616