1.

Conference Proceedings

Conference Proceedings
Nakanishi, T. ; Taguchi, M. ; Mitsuhira, N. ; Matsumoto, N. ; Ozaki, S. ; Komachi, K. ; Okumura, N.
Pub. info.: Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium.  pp.13-17,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-30
2.

Conference Proceedings

Conference Proceedings
Ozaki, S. ; Akahori, T. ; Tani, T. ; Nakayama, S.
Pub. info.: Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A..  pp.161-166,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 165
3.

Conference Proceedings

Conference Proceedings
Sugai, H. ; Hattori, T. ; Kawai, A. ; Ozaki, S. ; Kosugi, G. ; Ohtani, H. ; Hayashi, T. ; Ishigaki, T. ; Ishii, M. ; Sasaki, M. ; Shimono, A. ; Okita, Y. ; Sudo, J. ; Takeyama, N.
Pub. info.: Ground-based instrumentation for astronomy : 21-25 June 2004, Glasgow, Scotland, United Kingdom.  pp.643-650,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5492
4.

Technical Paper

Technical Paper
Cho, C. ; Higashi, S. ; Hiraoka, N. ; Maruyama, A. ; Ozaki, S. ; Sato, T. ; Suwada, T. ; Takahashi, T. ; Umeda, H. ; Tsuji, K.
Pub. info.: NASA Technical Reports.  (NASA-CP-2376-Vol-8),  pp.1-4,  1985.  National Aeronautics and Space Administration
5.

Technical Paper

Technical Paper
Cho, C. ; Higashi, S. ; Hiraoka, N. ; Ozaki, S. ; Sato, T. ; Suwada, T. ; Takahashi, T. ; Umeda,H
Pub. info.: NASA Technical Reports.  (NASA-CP-2376-Vol-7),  pp.1-1,  1985.  National Aeronautics and Space Administration