1.

Conference Proceedings
Conference Proceedings
1. Study of segmented overlay mark fidelity based on electrical property of device
Matsui, M. ; Machida, S. ; Todokoro, H. ; Otaka, T. ; Sugimoto, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.91-102,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
2.

Conference Proceedings
Conference Proceedings
2. Effect of various ArF resist shrinkage amplitudes on CD bias
Ke, C.-M. ; Gau, T.-S. ; Chen, P.-H. ; Yen, A. ; Lin, B.J. ; Otaka, T. ; Iizumi, T. ; Sasada, K. ; Ueda, K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.997-1006,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
3.

Conference Proceedings
Conference Proceedings
3. Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM
Kawada, H. ; Iizumi, T. ; Otaka, T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.861-865,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
4.

Conference Proceedings
Conference Proceedings
4. Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography
Ke, C.-M. ; Hung, H.-L. ; Chang, A. ; Chen, J.-H. ; Gau, T.-S. ; Ku, Y.-C. ; Lin, B.J. ; Otaka, T. ; Ueda, K. ; Kawada, H. ; Nomura, H. ; Ren, N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.173-182,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Prospects for using primary electron-based CD metrology
Rice, B.J. ; Crays, G.L. ; Danilevsky, A. ; Grumski, M.G. ; Koshihara, S. ; Otaka, T. ; Roberts, J.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1247-1253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375