1.

Conference Proceedings
Conference Proceedings
1. The Chemistry of Boron and Titanium Diboride Formation: Decomposition of TiCl4 and BCl3 in Hydrogen and Helium
Osterheld, Thomas H. ; Allendorf, Mark D.
Pub. info.: Covalent ceramics III - science and technology of non-oxides : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.465-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 410
2.

Conference Proceedings
Conference Proceedings
2. A Model of the Gas-Phase Chemistry of Boron Nitride CVD From BCl3 and NH3
Allendorf, Mark D. ; Melius, Carl F. ; Osterheld, Thomas H.
Pub. info.: Covalent ceramics III - science and technology of non-oxides : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A..  pp.459-,  1996.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 410
3.

Conference Proceedings
Conference Proceedings
3. THE DECOMPOSITION OF METHYLTRICHLOROSILANE: STUDIES IN A HIGH-TEMPERATURE FLOW REACTOR
Allendorf, Mark D. ; Osterheld, Thomas H. ; Melius, Carl F.
Pub. info.: Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.105-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 334
4.

Conference Proceedings
Conference Proceedings
4. Removal Rate, Uniformity and Defectivity Studies of Chemical Mechanical Polishing of BPSG Films
Bonner, Benjamin A. ; Fishkin, Boris ; David, Jeffrey ; Garretson, Chad ; Osterheld, Thomas H.
Pub. info.: Chemical mechanical polishing 2000 -- fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A..  pp.E8.6-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 613
5.

Conference Proceedings
Conference Proceedings
5. Using Wafer-Scale Patterns for CMP Analysis
Lee, Brian ; Gan, Terence ; Boning, Duane S. ; David, Jeffrey ; Bonuer, Benjamin A. ; McKeever, Peter ; Osterheld, Thomas H.
Pub. info.: Chemical mechanical polishing 2000 -- fundamentals and materials issues : symposium held April 26-27, 2000, San Francisco, California, U.S.A..  pp.E8.8-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 613
6.

Conference Proceedings
Conference Proceedings
6. MODELING THE GAS-PHASE CHEMISTRY OF SILICON CARBIDE FORMATION
Allendorf, Mark D. ; Osterheld, Thomas H.
Pub. info.: Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A..  pp.39-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 363
7.

Conference Proceedings
Conference Proceedings
7. THE DECOMPOSITION OF METHYLTRICHLOROSILANE IN HYDROGEN AND HELIUM
Osterheld, Thomas H. ; Allendorf, Mark D.
Pub. info.: Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A..  pp.27-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 363