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*PHOTO-EXCITED CLEANING OF SILICON WITH CHLORINE AND FLUORINE

Author(s):
Ito, T.
Sugino, R.
Sato, Y.
Okuno, M.
Osawa, A.
Aoyama, T.
Yamazaki, T.
Arimoto, Y.
3 more
Publication title:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
259
Pub. Year:
1992
Page(from):
195
Page(to):
206
Pages:
12
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
Language:
English
Call no.:
M23500/259
Type:
Conference Proceedings

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