Chang, J.P. ; Case, C.B. ; Krautter, H.W. ; Sapjeta, J. ; Opila, R.L. ; Decker, M.A.
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Interconnect and contact metallization for ULSI : proceedings of the international symposium. pp.261-269, 1999. Pennington, N.J.. Electrochemical Society
Proceedings of the Second International Symposium on Corrosion and Reliability of Electronic Materials and Devices. pp.86-98, 1993. Pennington, NJ. Electrochemical Society
Chang, J.P. ; Sapjeta, J. ; Rosamilia, J.M. ; Boone, T. ; Eng, J., Jr. ; Opila, R.L. ; Brennan, S. ; Wiemer, C. ; Pianetta, P.
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Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.17-24, 1999. Pennington, NJ. Electrochemical Society
Proceedings of the Second International Symposium on Corrosion and Reliability of Electronic Materials and Devices. pp.207-220, 1993. Pennington, NJ. Electrochemical Society
Proceedings of the Second International Symposium on Corrosion and Reliability of Electronic Materials and Devices. pp.193-206, 1993. Pennington, NJ. Electrochemical Society
Chang, J.P. ; Eng, J., Jr. ; Sapjeta, J. ; Opila, R.L. ; Cox, P. ; Pianetta, P.
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Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.129-136, 1999. Pennington, NJ. Electrochemical Society
Ma, Y. ; Chen, Y.N. ; Brown, M.M ; Li, F. ; Chen, Y. ; Eng, J., Jr. ; Opila, R.L. ; Chabal, Y.J. ; Sapjeta, J. ; Muller, D.A. ; Xing, G.C. ; Trowbridge, T. ; Khau, M. ; Tam, N.
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Rapid thermal and other short-time processing technologies : proceedings of the international symposium. pp.179-186, 2000. Pennington, NJ. Electrochemical Society
Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium. pp.193-206, 1999. Pennington, New Jersey. Electrochemical Society
Electronic packaging materials science IV : symposium held April 24-28, 1989, San Diego, California, U.S.A.. pp.277-282, 1989. Pittsburgh, Pa.. Materials Research Society
Mathew, A. ; Demirkan, K. ; Opila, R.L. ; Wang, C.-G. ; Maes, J. W. ; Wilk, G.
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.360-365, 2005. Pennington, NJ. Electrochemical Society