1.

Conference Proceedings
Conference Proceedings
1. Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography
Fukuhara,N. ; Haraguchi,T. ; Kanayama,K. ; Matsuo,T. ; Takeuchi,S. ; Tomiyama,K. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.979-986,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Wide-viewing-area glassless stereoscopic display using multiple projectors
Arimoto,A. ; Ooshima,T. ; Tani,T. ; Kaneko,Y.
Pub. info.: Stereoscopic displays and virtual reality systems V : 26-29 January 1998, San Jose, California.  pp.186-192,  1998.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3295
3.

Conference Proceedings
Conference Proceedings
3. ZrSiON as a material for high-transmittance attenuated PSM
Kanayama,K. ; Haraguchi,T. ; Yamazaki,T. ; Ii,T. ; Matsuo,T. ; Fukuhara,N. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.147-154,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409