1.

Conference Proceedings
Conference Proceedings
1. High-resolution DUV inspection system for 150-nm generation masks
Tabata,M. ; Tsuchiya,H. ; Sanada,Y. ; Nishizaka,T. ; Hirazawa,H. ; Kobayashi,N. ; Nagai,H. ; Watanabe,T. ; Oohashi,K. ; Inoue,H. ; Nomura,T. ; Ono,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.138-146,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Phase measurement using Hg-Xe lamp and KrF excimer laser
Oohashi,K. ; Fujiwara,T. ; Nomura,T. ; Ono,A.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.219-226,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
3.

Conference Proceedings
Conference Proceedings
3. Newly developed mask inspection system with DUV laser illumination
Oohashi,K. ; Inoue,H. ; Nomura,T. ; Ono,A. ; Tabata,M. ; Suzuki,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.452-461,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066