1.

Conference Proceedings
Conference Proceedings
1. Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements
Fields,C.H. ; Ray-Chaudhuri,A.K. ; Krenz,K.D. ; Oldham,W.G. ; Stulen,R.H.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.356-367,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
2.

Conference Proceedings
Conference Proceedings
2. Material limitations to 193-nm lithographic system lifetimes
Schenker,R.E. ; Piao,F. ; Oldham,W.G.
Pub. info.: Optical Microlithography IX.  Part2  pp.698-706,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings
Conference Proceedings
3. Temperature dependence of UV-induced compaction in fused silica
Piao,F. ; Schenker,R.E. ; Oldham,W.G.
Pub. info.: Optical Microlithography X.  pp.907-912,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. Durability of experimental fused silicas to 193-nm induced compaction
Schenker,R.E. ; Piao,F. ; Oldham,W.G.
Pub. info.: Optical Microlithography X.  pp.44-53,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051